Coat/Develop Equipment Localization Rate First Breaking 30% – Industry Significance
The lithography track—specifically coat and develop equipment—has long been one of the most strategically sensitive segments of semiconductor manufacturing. For years, a small number of global suppliers dominated this space, providing the photoresist coating and developing tools that sit directly alongside lithography scanners and define patterning quality and throughput. The news that localization rates for coat/develop equipment have, for the first time, broken through the 30% threshold is therefore more than a statistical milestone. It represents a meaningful shift in technological capability, supply‑chain security, and bargaining power across the industry.